Technical Symposium CM
This Symposium focuses on recent advances in microstructural, chemical, electrical, optical, and mechanical characterization of coatings and thin films, as well as advanced modelling and computation techniques, which enhance our understanding of the fundamental structure-property-processing relationships. In addition, the symposium will cover topics related to high-throughput thin film development including combinatorial synthesis, automated characterization, and data science approaches such as machine learning or artificial intelligence for large data processing. Of interest are contributions that either highlight the application of recent advances in analytical methods, characterization techniques, and nano-mechanical testing methods for coating evaluation or present advanced and innovative modelling techniques to understand coating properties.
CM1: Spatially-resolved and in situ Characterization of Thin Films, Coating and Engineered Surfaces
This session deals with all aspects concerning novel spatially-resolved structural, microstructural, and chemical characterization techniques, especially those that advance the in-depth understanding of the relationship between the processing, the structure, and the properties of thin films and engineered surfaces. Particular attention will be given to papers using cutting-edge experiments to provide information both during and post-growth microstructural investigation. Papers are furthermore also solicited in the emerging area of three-dimensional microstructural characterization in small volumes, such as FIB/SEM/EBSD tomography and ToF-SIMS 3D mapping, dynamic characterization of thin film growth, operando cutting experiments, nanoindentation, ellipsometry, wide- and small-angle X-ray/neutron scattering, reflectometry, TEM characterization, micro-Raman spectroscopy, etc.
CM1 Invited Speakers:
- Jens Birch, Linköping University, Sweden
- Aleksandr Goikhman, Koenigs Systems, Germany
- Marie-Ingrid Richard, CEA Grenoble, France
- Lillian Vogl, UC Berkeley, USA
CM2: Advanced Mechanical Testing of Surfaces, Thin Films, Coatings and Small Volumes
This session covers advanced mechanical characterization techniques for surfaces, thin films, and coatings with a focus on the development of novel methods. This includes novel methods for performing nanoindentation and advanced micro-scale testing on coatings, thin films, and nanostructures produced by FIB or other lithography techniques. Particular attention will be given to papers providing characterization in non-ambient and extreme conditions (harsh, cyclic, and/or unusual conditions, such as high or cryogenic temperatures, radiation, and high strain rates). Emphasis will be given to multi-techniques nanomechanical testing, performed in situ in the SEM, TEM, Raman, X-ray beamline, etc. Papers are furthermore also solicited in hydrogen characterization and its effect on the deformation mechanism and embrittlement of coatings and thin films.
CM2 Invited Speakers:
- Jazmin Duarte, Max-Planck Institut für Eisenforschung, Germany
- Peter Felfer, Friedrich-Alexander University, Germany
- Subin Lee, Karlsruher Institut für Technology, Germany
CM3: Accelerated Thin Film Development: High-throughput Synthesis, Automated Characterization and Data Analysis
This session covers all topics related to accelerated, high-throughput thin films and coatings development. This includes studies on rapid thin film materials development and coatings optimization but also recent advances and developments in high-throughput research methods. Of particular interest are advanced approaches for synthesis, such as combinatorial or autonomous thin film deposition, but also automated characterization techniques. An emphasis is put on the role of data, the efficient handling of large data sets as well as the application of data science techniques and machine learning to high-throughput experimental workflows. This session complements CMD4 which focuses on advanced theoretical approaches for materials discovery and design.
CM3 Invited Speakers:
- Alfred Ludwig, Ruhr-Universität Bochum, Germany
- Jennifer Rupp, Technical University of Munich, Germany
- Shijing Sun, Toyota Research Institute, University of Washington
- Andriy Zakutayev, National Renewable Energy Laboratory, USA
CM4: Simulations, Machine Learning, and Data Science for Materials Design and Discovery
This session presents computational and simulation methods, machine learning, artificial intelligence, and visualization algorithms, as well as best practices of their applications for knowledge-based materials design and discovery. It welcomes contributions devoted to (1) aid understanding of material structures and properties based on computations and simulations spanning from the atomic level to macroscale, (2) use of machine-learning algorithms for describing material properties or rapidly screen compositional landscapes, (3) generation, curation, and exploration of big materials data from a wide range of sources, including computations and experiments. Additionally, (4) predictive process modeling and simulations will be discussed as a tool that provides irreplaceable insight into process conditions and quantities that cannot be measured. Process modeling provides an additional layer of physics-based metadata that can be leveraged by machine learning and AI methods. This session complements CMD3 focusing on experimental high throughput synthesis, characterization, and data analysis.
CM4 Invited Speakers:
- Nikola Koutna, TU Wien, Austria, “Nanoscale Simulations of Deformation and Fracture via Machine Learning Assisted Molecular Dynamics”
- Moritz To Baben, GTT-Technologies, Germany, “DFT+ ML + Calphad: From Qualitative to Quantitative Phase Stability Predictions”
- Kenneth Vecchio, University of California San Diego, USA