Summary
Sputter deposition is a mature technique for low-temperature synthesis of high-quality films. It employs ion-solid interaction at the target to produce a high-energy flux of deposited atom as well as at the substrate to control film composition, structure and properties. The fundamental aspects of this techniques are based on a wealth of ion solid interactions which will be elucidated in this module.
Topics
- Sputtering as an ion-solid process (sputtering yield, angular, energy distribution, sputtering efficiency)
- Electron emission
- Negative ion formation
- Reflected neutrals
- Transport of atoms through the gas phase
- Sputtering systems
- Conventional diode sputtering
- Triode sputtering
- Magnetron sputtering
- Discharge characteristics
- Ion distribution at substrate
- Pulsed and High-Power Pulsed Magnetron Sputtering
- Independent control of ion flux and ion energy at the substrate
Instructor
Ivan Petrov
PhD, D.h.c., Professor
Materials Research Laboratory, Univ. of Illinois at Urbana-Champaign, USA
Department of Physics, Linköping University, Sweden