Summary
This module will provide a brief introduction into the method of spectroscopic ellipsometry and is intended to provide help with the use of ellipsometry to characterize optical and structural properties of thin films. Ellipsometry is a model-based technique and can provide very accurate material properties of well-defined bulk materials, thin films and heterostructures. Its accuracy provides monolayer sensitivity, and which can be exploited in in-situ applications also for monitoring of thin film evolution and growth dynamics. Various examples will guide understanding for contemporary applications in thin film characterization.
Topics
- Applications of ellipsometry for thin film materials characterization
- Thin film model analysis and error evaluation
- Measurement and data analysis strategies for thin films
Instructor
Ufuk Kilic
Research Assistant Professor
Electrical and Computer Engineering
University of Nebraska-Lincoln
